Invention Grant
- Patent Title: Methods of alignment, overlay, configuration of marks, manufacturing of patterning devices and patterning the marks
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Application No.: US17626896Application Date: 2020-06-15
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Publication No.: US11675281B2Publication Date: 2023-06-13
- Inventor: Jin Dai , Sanjaysingh Lalbahadoersing
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 186248 2019.07.15 EP 186925 2019.07.18
- International Application: PCT/EP2020/066478 2020.06.15
- International Announcement: WO2021/008794A 2021.01.21
- Date entered country: 2022-01-13
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
A resonant amplitude grating mark has a periodic structure configured to scatter radiation incident on the mark. The scattering is mainly by coupling of the incident radiation to a waveguiding mode in the periodic structure. The effective refractive indexes and lengths of portions of the periodic structure are configured to provide an optical path length of the unit cell in the direction of periodicity that essentially equals an integer multiple of a wavelength present in the radiation. The effective refractive indexes and lengths of the portions are also configured to provide an optical path length of the second portion in the direction of periodicity that is selected from 0.30 to 0.49 of the wavelength present in the spectrum of the radiation.
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