- Patent Title: Method for decision making in a semiconductor manufacturing process
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Application No.: US17423325Application Date: 2020-01-09
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Publication No.: US11687007B2Publication Date: 2023-06-27
- Inventor: Arnaud Hubaux , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 154100 2019.01.29 EP 155660 2019.02.06 EP 209695 2019.11.18
- International Application: PCT/EP2020/050354 2020.01.09
- International Announcement: WO2020/156769A 2020.08.06
- Date entered country: 2021-07-15
- Main IPC: G03F1/70
- IPC: G03F1/70 ; G03F7/30 ; G03F7/00 ; G06F30/392

Abstract:
A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
Public/Granted literature
- US20220082949A1 METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS Public/Granted day:2022-03-17
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