- Patent Title: Semiconductor device and method of forming a semiconductor device
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Application No.: US16722137Application Date: 2019-12-20
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Publication No.: US11706987B2Publication Date: 2023-07-18
- Inventor: You Qian , Joan Josep Giner De Haro , Rakesh Kumar
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Viering Jentschura & Partner MBB
- Main IPC: H01L41/314
- IPC: H01L41/314 ; H10N30/072 ; H10N30/074 ; H10N30/85 ; H10N30/87

Abstract:
A semiconductor device may include: a substrate wafer, a bonding layer at least partially covering a front surface of the substrate wafer, a plurality of silicon pillars bonded to the front surface of the substrate wafer by the bonding layer, a single-crystal piezoelectric film having a first surface and an opposing second surface, a top electrode arranged adjacent to the first surface of the single-crystal piezoelectric film, and a bottom electrode arranged adjacent to the second surface of the single-crystal piezoelectric film. The single-crystal piezoelectric film may be supported by the plurality of silicon pillars such that the second surface of the piezoelectric film and the front surface of the substrate wafer enclose a cavity therebetween.
Public/Granted literature
- US20210193906A1 SEMICONDUCTOR DEVICE AND METHOD OF FORMING A SEMICONDUCTOR DEVICE Public/Granted day:2021-06-24
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