Invention Grant
- Patent Title: Movable wafer holder for film deposition chamber having six degrees of freedom
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Application No.: US16657841Application Date: 2019-10-18
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Publication No.: US11742231B2Publication Date: 2023-08-29
- Inventor: Hsuan-Chih Chu , Wen-Hao Cheng , Yen-Yu Chen , Yi-Ming Dai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/54 ; H01L21/673 ; H01L21/67 ; H01L21/66 ; H01L21/687 ; C23C14/50 ; B25B11/00 ; C30B25/12 ; B25J11/00 ; B29C64/241 ; B25J18/04 ; B25F5/02 ; H01J37/20 ; B05C13/00

Abstract:
The present disclosure provides a flexible workpiece pedestal capable of tilting a workpiece support surface. The workpiece pedestal further includes a heater mounted on the workpiece support surface. The heater includes a plurality of heating sources such as heating coils. The plurality of heating sources in the heater allows heating the workpiece at different temperatures for different zones of the workpiece. For example, the workpiece can have a central zone heated by a first heating coil, a first outer ring zone that is outside of the central zone heated by a second heating coil, a second outer ring zone that is outside of the first outer ring zone heated by a third heating coil. By using the tunable heating feature and the tilting feature of the workpiece pedestal, the present disclosure can reduce or eliminate the shadowing effect problem of the related workpiece pedestal in the art.
Public/Granted literature
- US20210118700A1 WAFER HOLDER FOR FILM DEPOSITION CHAMBER Public/Granted day:2021-04-22
Information query
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