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1.发明申请公开(公告)号：US20250140776A1
公开(公告)日：2025-05-01
申请号：US18497358
申请日：2023-10-30
Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
Inventor： Daniel RYAN , Nicole Ellison , Shaomao Xu
IPC: H01M4/04 , B05C5/02 , B05C9/04 , B05C11/11 , B05C13/00 , B22D1/00 , B22D19/00 , C23C26/02 , H01M4/38
Abstract: A method of manufacturing an alkali metal coated current collector for a battery, the method includes melting the alkali metal, removing impurities floating on the surface of the melted alkali metal; applying the purified melted alkali metal to the surface of at least one side of a passing current collector substrate to form a coating on the current collector substrate. A system for manufacturing an alkali metal coated current collector for a battery includes at least one extruder having a melt chamber, an inlet extending to the melt chamber, at least one feed roller in the inlet for feeding alkali metal introduced into the inlet to the melt chamber; a heater for melting alkali metal in the melt chamber; an opening in the chamber for removing impurities floating on the melted alkali metal in the melt chamber; an outlet extending from the melt chamber to a dispensing opening; a reservoir for receiving melted alkali metal; and at least one drive roller for driving a current collector substrate past the reservoir to receive a coating of melted alkali metal.
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公开(公告)号：US20250073742A1
公开(公告)日：2025-03-06
申请号：US18768390
申请日：2024-07-10
Applicant: SEMES CO., LTD. , SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jin Yeong Sung , Ki Hoon Choi , Seung Un Oh , Young Ho Park , Sang Hyeon Ryu , Jang Jin Lee , Hyun Yoon , Sang Gun Lee , Yu Jin Cho , Ho Jong Hwang , Jong Ju Park , Jong Keun Oh , Yong Woo Kim
IPC: B05C13/00 , G05B19/401 , G05B19/404 , G06T7/73
Abstract: Provided is a control device and a substrate processing apparatus including the same. The substrate processing apparatus includes a support unit configured to support and rotate a first substrate, the support unit including a spin chuck, a spray unit configured to spray a processing fluid on the first substrate, a correction unit on a swing arm and configured to irradiate a beam onto the first substrate when the processing fluid is provided on the first substrate, wherein the swing arm is adjacent to the spin chuck and is configured to move the correction unit to a target point on the first substrate, and a controller configured to control the spin chuck and the swing arm, and correct a position error of the swing arm using a second substrate, wherein a plurality of anchor patterns are on the second substrate.
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公开(公告)号：US20240390935A1
公开(公告)日：2024-11-28
申请号：US18793630
申请日：2024-08-02
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Shiori HIROSE , Masahiro TOKOH , Kenichi OOSHIRO
Abstract: According to an embodiment, a winding apparatus includes a winding core and an air flow controller. The winding core winds a belt-shaped structure comprising a substrate and an edge-coating part that covers an edge of a substrate in a width direction, the edge-coating part being coated with a material liquid on a surface of the substrate. The air flow controller has a nozzle that performs at least either ejection or suction of a gas, and adjusts an air flow in the vicinity of the edge-coating part of the film of the belt-shaped structure, which is wound by a winding core.
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公开(公告)号：US20240282910A1
公开(公告)日：2024-08-22
申请号：US18653964
申请日：2024-05-02
Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
Inventor： Wei CHEN , Huan CHE , Yuting LI , Yalong QING , Tao NIE , Fang LUO , Shisong LI
CPC classification number: H01M4/0471 , B05C13/00 , H01M4/0404
Abstract: A strip diverting mechanism includes a negative pressure unit and an air discharge unit. The negative pressure unit and the air discharge unit are arranged opposite each other, and a gap through which a strip passes is formed between the negative pressure unit and the air discharge unit. The negative pressure unit is configured to provide a suction force to the strip and the air discharge unit is configured to provide a repulsive force to the strip, to prevent the strip from contacting the negative pressure unit and the air discharge unit. The negative pressure unit comprises two air channels located at two sides of the negative pressure unit and configured to discharge air to a direction away from the negative pressure unit, to generate a negative pressure area at a center of the negative pressure unit.
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公开(公告)号：US12064785B2
公开(公告)日：2024-08-20
申请号：US17989177
申请日：2022-11-17
Applicant: Samsung Display Co., Ltd.
Inventor： Seoyoung Jang , Boa Kim , Yong-Kwan Kim , Jiin Yoon , Kyungeun Lee , Jinnyoung Heo
CPC classification number: B05C13/00 , B05C5/02 , B05D1/02 , C03C17/002 , C03C2218/112
Abstract: A window coating jig includes: a base part and a stage which includes a support part, a first sidewall part surrounding the support part and defining an outer wall, and a second sidewall part disposed between the support part and the first sidewall part, and protrudes from the base part, wherein a blow groove is defined between the first sidewall part and the second sidewall part, a suction groove is defined between the second sidewall part and the support part, the base part has a blow hole and a suction hole passing through the base part, the blow hole and the suction hole being defined therein, the blow hole overlaps the blow groove, the suction hole overlaps the suction groove, and the first sidewall part has a vent opening passing therethrough in a direction crossing the direction in which the blow hole extends, the vent opening being defined therein.
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Patent Agency Ranking
公开(公告)号：US20240207889A1
公开(公告)日：2024-06-27
申请号：US18493123
申请日：2023-10-24
Applicant: Resonac Corporation
Inventor： Takayuki Mori
Abstract: A support unit of a carrier that holds a substrate, includes a plurality of rotating members configured to support the carrier inside a chamber where a film forming process is performed on the substrate when transporting the carrier, and a support body configured to rotatably support the plurality of rotating members inside the chamber. The support body extends from an upstream side to a downstream side in a transport direction of the carrier. The plurality of rotating members are arranged on the support body in a line from the upstream side to the downstream side of the support body. An interval between adjacent rotating members of a first set disposed on one of the upstream side and the downstream side of the support body is narrower than an interval between adjacent rotating members of a second set disposed between the upstream side and the downstream side of the support body.
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公开(公告)号：US12011735B2
公开(公告)日：2024-06-18
申请号：US17941852
申请日：2022-09-09
Applicant: Signature Brands, LLC
Inventor： Sean Moran , Thomas Thiemann , Charles Hodges , Joshua Gordon
Abstract: A material deposition device for decorating an object. The device has a housing as a structural framework, an object holder, and a container releasably coupled to the housing. The housing has an object support for supporting the object to be decorated. The container creates a volumetric enclosure with the housing. The device is configured to deposit decoration materials onto the object.
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公开(公告)号：US20240150889A1
公开(公告)日：2024-05-09
申请号：US18502354
申请日：2023-11-06
Applicant: Resonac Corporation
Inventor： Chihiro TAMURA , Kengo NOGAMI , Kazuyuki YOSHINO
CPC classification number: C23C14/568 , B05C13/00
Abstract: Falling of a substrate and deformation or breakage of the substrate are inhibited. A substrate holder includes a hole portion in which a disk-shaped substrate is placed upright, and at least four supporting members attached elastically-deformably on a periphery of the hole portion. Two of the four supporting members support disk-shaped substrate at first- and second-side circumferential end portions of disk-shaped substrate positioned at vertical-direction upper positions of disk-shaped substrate. Remaining two of the four supporting members support disk-shaped substrate at third- and fourth-side circumferential end portions of disk-shaped substrate positioned at vertical-direction lower positions of disk-shaped substrate. Central angle in disk-shaped substrate between either first- or second-side circumferential end portion and uppermost end portion of disk-shaped substrate is from 15° through 40°. Central angle in disk-shaped substrate between either third- or fourth-side circumferential end portion and lowermost end portion of disk-shaped substrate is from 10° through 15°.
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公开(公告)号：US11848226B2
公开(公告)日：2023-12-19
申请号：US17183146
申请日：2021-02-23
Applicant: Applied Materials, Inc.
Inventor： Anhthu Ngo , Zuoming Zhu , Balasubramanian Ramachandran , Paul Brillhart , Edric Tong , Anzhong Chang , Kin Pong Lo , Kartik Shah , Schubert S. Chu , Zhepeng Cong , James Francis Mack , Nyi O. Myo , Kevin Joseph Bautista , Xuebin Li , Yi-Chiau Huang , Zhiyuan Ye
IPC: H01L21/687 , C30B25/12 , B05C13/02 , B05C13/00 , H01L21/673 , C23C16/458
CPC classification number: H01L21/68735 , B05C13/00 , B05C13/02 , C30B25/12 , H01L21/67326 , H01L21/6875 , H01L21/68785 , C23C16/4585
Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
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公开(公告)号：US20230352650A1
公开(公告)日：2023-11-02
申请号：US18350680
申请日：2023-07-11
Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
Inventor： Wei CHEN , Huan CHE , Yuting LI , Yalong QING , Tao NIE , Fang LUO , Shisong LI
CPC classification number: H01M4/0471 , B05C13/00 , H01M4/0404
Abstract: A strip diverting mechanism includes a negative pressure unit and an air discharge unit. The negative pressure unit and the air discharge unit are arranged opposite each other, and a gap through which a strip passes is formed between the negative pressure unit and the air discharge unit. The negative pressure unit is configured to provide a suction force to the strip and the air discharge unit is configured to provide a repulsive force to the strip, to prevent the strip from contacting the negative pressure unit and the air discharge unit.
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