Invention Grant
- Patent Title: Vertical power semiconductor device including a field stop region having a plurality of impurity peaks
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Application No.: US17217251Application Date: 2021-03-30
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Publication No.: US11742384B2Publication Date: 2023-08-29
- Inventor: Hans-Joachim Schulze , Christian Jaeger , Moriz Jelinek , Daniel Schloegl , Benedikt Stoib
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE 2020110072.8 2020.04.09
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L29/739 ; H01L29/06 ; H01L29/66 ; H01L21/265 ; H01L21/322 ; H01L29/10

Abstract:
A vertical power semiconductor device is proposed. The vertical power semiconductor device includes a semiconductor body having a first main surface and a second main surface opposite to the first main surface along a vertical direction. The vertical power semiconductor device further includes a drift region in the semiconductor body. The drift region includes platinum atoms. The vertical power semiconductor device further includes a field stop region in the semiconductor body between the drift region and the second main surface. The field stop region includes a plurality of impurity peaks. A first impurity peak of the plurality of impurity peaks has a larger concentration than a second impurity peak of the plurality of impurity peaks. The first impurity peak includes hydrogen and the second impurity peak includes helium.
Public/Granted literature
- US20210320174A1 VERTICAL POWER SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD Public/Granted day:2021-10-14
Information query
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