Invention Grant
- Patent Title: Method for producing film
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Application No.: US17847228Application Date: 2022-06-23
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Publication No.: US11745216B2Publication Date: 2023-09-05
- Inventor: Ryo Kumegawa , Sosuke Osawa , Miki Tamada , Ken Maruyama , Motohiro Shiratani
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Element IP, PLC
- Priority: JP 21106269 2021.06.28
- Main IPC: B05D1/00
- IPC: B05D1/00 ; B05D1/32 ; C08J5/18 ; C08F297/02

Abstract:
A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.
Public/Granted literature
- US20230027151A1 METHOD FOR PRODUCING FILM Public/Granted day:2023-01-26
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