Invention Grant
- Patent Title: ALD cycle time reduction using process chamber lid with tunable pumping
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Application No.: US17028184Application Date: 2020-09-22
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Publication No.: US11767590B2Publication Date: 2023-09-26
- Inventor: Muhannad Mustafa , Muhammad M. Rasheed , Mario D. Sanchez , Anqing Cui
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/44
Abstract:
Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.
Public/Granted literature
- US20210087686A1 ALD CYCLE TIME REDUCTION USING PROCESS CHAMBER LID WITH TUNABLE PUMPING Public/Granted day:2021-03-25
Information query
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