公开(公告)号：US11732358B2

公开(公告)日：2023-08-22

申请号：US17889930

申请日：2022-08-17

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Srinivas Gandikota ,  Wei V. Tang

IPC: C23C16/40 ,  C23C16/455 ,  C23C16/52 ,  C23C16/50

CPC classification number: C23C16/45565 ,  C23C16/455 ,  C23C16/45536 ,  C23C16/50 ,  C23C16/52

Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.

公开(公告)号：US20210087686A1

公开(公告)日：2021-03-25

申请号：US17028184

申请日：2020-09-22

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US12054826B2

公开(公告)日：2024-08-06

申请号：US18224206

申请日：2023-07-20

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45544 ,  C23C16/4408

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US10755947B2

公开(公告)日：2020-08-25

申请号：US16400248

申请日：2019-05-01

Applicant: Applied Materials, Inc.

Inventor： Wenyu Zhang ,  Yixiong Yang ,  Mario D. Sanchez ,  Guoqiang Jian ,  Wei V. Tang ,  Paul F. Ma

IPC: H01L21/321 ,  H01L21/3213 ,  H01L29/49

Abstract: Processing methods comprising etching a metal nitride layer with an etchant. The etchant can be, for example, WCl5, WOCl4 or TaCl5. Methods of improving the selectivity of etch processes are also disclosed.

公开(公告)号：US11719255B2

公开(公告)日：2023-08-08

申请号：US17873706

申请日：2022-07-26

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez

IPC: C23C16/40 ,  F04D29/42 ,  F04D29/62 ,  C23C16/44

CPC classification number: F04D29/4286 ,  C23C16/4412 ,  F04D29/62

Abstract: Pumping liners for process chambers including a first ring-shaped body and a second ring-shaped body are described. The first ring-shaped body has a first plurality of openings and the second ring-shaped body has a second plurality of openings. The first ring-shaped body and the second ring-shaped body are rotatable relative to each other around a central axis to at least partially overlap the first plurality of openings and the second plurality of openings to change the area of conductance through the openings. Methods of removing gases from a processing chamber are also described.

公开(公告)号：US20210395892A1

公开(公告)日：2021-12-23

申请号：US17350073

申请日：2021-06-17

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Srinivas Gandikota ,  Wei V. Tang

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/52

Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.

公开(公告)号：US20190341268A1

公开(公告)日：2019-11-07

申请号：US16400248

申请日：2019-05-01

Applicant: Applied Materials, Inc.

Inventor： Wenyu Zhang ,  Yixiong Yang ,  Mario D. Sanchez ,  Guoqiang Jian ,  Wei Tang ,  Paul F. Ma

IPC: H01L21/3213 ,  H01L29/49

Abstract: Processing methods comprising etching a metal nitride layer with an etchant. The etchant can be, for example, WCl5, WOCl4 or TaCl5. Methods of improving the selectivity of etch processes are also disclosed.

公开(公告)号：US20230357927A1

公开(公告)日：2023-11-09

申请号：US18224206

申请日：2023-07-20

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45544 ,  C23C16/4408

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US20220389585A1

公开(公告)日：2022-12-08

申请号：US17889930

申请日：2022-08-17

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Srinivas Gandikota ,  Wei V. Tang

IPC: C23C16/455 ,  C23C16/52 ,  C23C16/50

Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.

公开(公告)号：US11447866B2

公开(公告)日：2022-09-20

申请号：US17350073

申请日：2021-06-17

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Srinivas Gandikota ,  Wei V. Tang

IPC: C23C16/40 ,  C23C16/455 ,  C23C16/52 ,  C23C16/50

Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.