Invention Grant
- Patent Title: Adhesive agent composition, layered product and production method for layered product, and method for reducing thickness of semiconductor forming substrate
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Application No.: US17297174Application Date: 2019-11-26
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Publication No.: US11776837B2Publication Date: 2023-10-03
- Inventor: Shunsuke Moriya , Kazuhiro Sawada , Tetsuya Shinjo
- Applicant: NISSAN CHEMICAL CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: GREENBLUM & BERNSTEIN, P.L.C.
- Priority: JP 18222885 2018.11.28
- International Application: PCT/JP2019/046201 2019.11.26
- International Announcement: WO2020/111069A 2020.06.04
- Date entered country: 2021-05-26
- Main IPC: H01L21/683
- IPC: H01L21/683 ; C09J183/04 ; B32B37/12 ; C09J7/40 ; B05D3/02

Abstract:
An adhesive composition for forming an adhesive layer that can bond a first substrate formed of a semiconductor-forming substrate to a second substrate formed of a support substrate in a peelable manner, the composition containing a component (A) which is cured through hydrosilylation and a peeling component (B) which contains a component containing an epoxy-modified polyorganosiloxane, wherein the component (A) contains a polysiloxane (A1) including a siloxane unit represented by SiO2 (unit Q) and the like, and a platinum group metal catalyst (A2); and the polysiloxane (A1) contains a polyorganosiloxane (a1) including a siloxane unit represented by SiO2 (unit Q′) and the like, and a polyorganosiloxane (a2) including a siloxane unit represented by SiO2 (unit Q″) and the like, and having a functional group (Si—H) content of 5.0 mol/kg or greater.
Public/Granted literature
Information query
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