Invention Grant
- Patent Title: Composition, and method for cleaning adhesive polymer
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Application No.: US17634625Application Date: 2020-07-30
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Publication No.: US11781092B2Publication Date: 2023-10-10
- Inventor: Kotaro Hayashi
- Applicant: RESONAC CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Resonac Corporation
- Current Assignee: Resonac Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 19154914 2019.08.27
- International Application: PCT/JP2020/029340 2020.07.30
- International Announcement: WO2021/039274A 2021.03.04
- Date entered country: 2022-02-11
- Main IPC: C11D1/72
- IPC: C11D1/72 ; C11D3/24 ; C11D3/43 ; C11D7/50 ; C11D7/28 ; C11D7/32 ; C11D3/20 ; C11D7/26 ; C11D3/28 ; B08B3/08

Abstract:
Provided is a composition which has an excellent affinity with the surface of an adhesive agent and can achieve a high etching rate. The composition according to one embodiment comprises: a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and, as an aprotic solvent, (A) an N-substituted amide compound having no active hydrogen on a nitrogen atom, and (B) a dipropylene glycol dimethyl ether, wherein (B) the dipropylene glycol dimethyl ether has the percentage of a structural isomer represented by formula (1) of at least 50 mass % with respect to the total amount of (B) the dipropylene glycol dimethyl ether.
Public/Granted literature
- US20220290078A1 COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER Public/Granted day:2022-09-15
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