Invention Grant
- Patent Title: Annealing apparatus
-
Application No.: US16535021Application Date: 2019-08-07
-
Publication No.: US11804389B2Publication Date: 2023-10-31
- Inventor: Byung Soo So , In Cheol Ko , Jong Jun Baek , Jae Woo Jeong
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR 20180093047 2018.08.09
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H05B6/80 ; H01L29/786 ; H01L27/12

Abstract:
An annealing apparatus includes: a main body configured to receive a substrate; a microwave generating unit configured to generate microwaves to be transmitted to the main body; an incidence unit configured to transmit the microwaves from the microwave generating unit to the main body; and a diffraction unit disposed between the incident unit and the main body. The diffraction unit is configured to pass the microwaves therethrough before they are transmitted to the main body.
Public/Granted literature
- US20200051835A1 ANNEALING APPARATUS Public/Granted day:2020-02-13
Information query
IPC分类: