- Patent Title: Three-dimensional memory devices and fabricating methods thereof
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Application No.: US17212754Application Date: 2021-03-25
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Publication No.: US11871567B2Publication Date: 2024-01-09
- Inventor: Kun Zhang
- Applicant: Yangtze Memory Technologies Co., Ltd.
- Applicant Address: CN Hubei
- Assignee: Yangtze Memory Technologies Co., Ltd.
- Current Assignee: Yangtze Memory Technologies Co., Ltd.
- Current Assignee Address: CN Hubei
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11519 ; H10B43/27 ; H10B41/10 ; H10B41/27 ; H10B43/10 ; H10B41/35 ; H10B43/35

Abstract:
A three-dimensional (3D) memory device is disclosed. The 3D memory device comprises an alternating layer stack on a substrate, and a top selective gate cut structure having a laminated structure embedded in an upper portion of the alternating layer stack and extending along a lateral direction. The laminated structure of the top selective gate cut structure comprises a dielectric filling wall and a dummy channel and a dummy functional layer on both sides of the dielectric filling wall.
Public/Granted literature
- US20210210509A1 THREE-DIMENSIONAL MEMORY DEVICES AND FABRICATING METHODS THEREOF Public/Granted day:2021-07-08
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