Invention Grant
- Patent Title: Electrodeless plasma device
-
Application No.: US18012146Application Date: 2021-06-21
-
Publication No.: US11881390B2Publication Date: 2024-01-23
- Inventor: Pierre F Thibault
- Applicant: Pierre F Thibault
- Applicant Address: CA Boucherville
- Assignee: Pierre F Thibault
- Current Assignee: Pierre F Thibault
- Current Assignee Address: CA Boucherville
- Agency: MBM Intellectual Property Law LLP
- International Application: PCT/CA2021/050845 2021.06.21
- International Announcement: WO2021/258194A 2021.12.30
- Date entered country: 2022-12-21
- Main IPC: H01J5/04
- IPC: H01J5/04 ; H01J61/34 ; H01J65/04

Abstract:
A closed loop tubular discharge assembly for an electrodeless light-emitting device and discharge reactor is disclosed. The discharge assembly comprises one or more tubular segments tubularly connected at their respective ends to form the closed loop tubular assembly, which hermetically encloses an ionizable gas. At least one of the one or more tubular segments forms a non-cylindrical, hollow-shaped tubular segment. In one embodiment, the non-cylindrical, hollow-shaped segment is formed by an internal tube at least partially enclosed within an external tube, forming a hollow-shaped discharge envelope enclosing the ionizable gas there between. When a discharge current circulates in the ionizable gas of the envelope, a hollow-shaped plasma is created in the envelope and surrounds the internal tube. This design has been shown to increase performance and provide several improvements over prior art devices.
Public/Granted literature
- US20230274927A1 ELECTRODELESS PLASMA DEVICE Public/Granted day:2023-08-31
Information query