Invention Grant
- Patent Title: Molybdenum thin films by oxidation-reduction
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Application No.: US16990303Application Date: 2020-08-11
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Publication No.: US11891690B2Publication Date: 2024-02-06
- Inventor: Feng Q. Liu , Alexander Jansen , Mark Saly
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/455 ; H01L21/285 ; H01L21/02
Abstract:
A method of forming a molybdenum film by oxidation and reduction is disclosed. A molybdenum oxide film is formed by CVD or ALD using a halide free organometallic molybdenum precursor. The molybdenum oxide film contains low amounts of carbon impurities. The molybdenum oxide film is reduced to form a highly pure molybdenum film. The molybdenum film has low resistance and properties similar to bulk molybdenum.
Public/Granted literature
- US20210047726A1 Molybdenum Thin Films By Oxidation-Reduction Public/Granted day:2021-02-18
Information query
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