Invention Grant
- Patent Title: High voltage gallium oxide (Ga
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Application No.: US17291689Application Date: 2019-10-30
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Publication No.: US11894468B2Publication Date: 2024-02-06
- Inventor: Wenshen Li , Zongyang Hu , Kazuki Nomoto , Debdeep Jena , Huili Grace Xing
- Applicant: Cornell University
- Applicant Address: US NY Ithaca
- Assignee: Cornell University
- Current Assignee: Cornell University
- Current Assignee Address: US NY Ithaca
- Agency: Culhane Meadows PLLC
- Agent Orlando Lopez
- International Application: PCT/US2019/058864 2019.10.30
- International Announcement: WO2020/096838A 2020.05.14
- Date entered country: 2021-05-06
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/24 ; H01L29/36 ; H01L29/40 ; H01L29/66

Abstract:
Described herein are the design and fabrication of Group III trioxides, such as β-Ga2O3, trench-MOS barrier Schottky (TMBS) structures with high voltage (>1 kV), low leakage capabilities, while addressing on the necessary methods to meet the requirements unique to Group III trioxides, such as β-Ga2O3.
Public/Granted literature
- US20210384362A1 HIGH VOLTAGE GALLIUM OXIDE (GA2O3) TRENCH MOS BARRIER SCHOTTKY AND METHODS OF FABRICATING SAME Public/Granted day:2021-12-09
Information query
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