Invention Grant
- Patent Title: Method of adjusting the output power of a power supply supplying electrical power to a plasma, plasma apparatus and power supply
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Application No.: US17553875Application Date: 2021-12-17
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Publication No.: US11929233B2Publication Date: 2024-03-12
- Inventor: Jakub Swiatnicki , Krzysztof Ruda , Mateusz Wiosna , Grzegorz Toczylowski , Jialei Chen
- Applicant: TRUMPF Huettinger Sp. z o. o.
- Applicant Address: PL Zielonka
- Assignee: TRUMPF HUETTINGER SP. Z O. O.
- Current Assignee: TRUMPF HUETTINGER SP. Z O. O.
- Current Assignee Address: PL Zielonka
- Agency: LEYDIG, VOIT & MAYER, LTD.
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A method adjusts an output power of a power supply supplying electrical power to a plasma in a plasma chamber. The method includes: connecting the power supply to at least one electrode in the plasma chamber; transporting one or more substrates relative to the electrode using a substrate carrier; maintaining the plasma by the electrical power; processing the one or more substrates with the plasma; and adjusting the output power based on a parameter related to a distance between a surface of the electrode facing a carrier-substrate-assembly and a surface of the substrate-carrier-assembly facing the electrode.
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