Invention Grant
- Patent Title: Frame member for electron beam lithography device and electron beam lithography device
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Application No.: US17288321Application Date: 2019-10-23
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Publication No.: US11934096B2Publication Date: 2024-03-19
- Inventor: Shigenobu Furukawa , Koji Akashi
- Applicant: KYOCERA Corporation
- Applicant Address: JP Kyoto
- Assignee: KYOCERA CORPORATION
- Current Assignee: KYOCERA CORPORATION
- Current Assignee Address: JP Kyoto
- Agency: Procopio, Cory, Hargreaves Savitch LLP
- Priority: JP 18202938 2018.10.29 JP 19091940 2019.05.15
- International Application: PCT/JP2019/041520 2019.10.23
- International Announcement: WO2020/090580A 2020.05.07
- Date entered country: 2021-04-23
- Main IPC: G03F1/78
- IPC: G03F1/78 ; G03F7/20 ; H01J37/305
Abstract:
A frame member for an electron beam lithography device of the present disclosure includes a frame body comprising sapphire or aluminum oxide-based ceramics having an open porosity of 0.2% or less and a conductive film disposed at least on a main surface of an electron gun side of the frame body.
Public/Granted literature
- US20210375579A1 FRAME MEMBER FOR ELECTRON BEAM LITHOGRAPHY DEVICE AND ELECTRON BEAM LITHOGRAPHY DEVICE Public/Granted day:2021-12-02
Information query
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