Invention Grant
- Patent Title: Polarization measuring device and method of fabricating semiconductor device using the same
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Application No.: US17740529Application Date: 2022-05-10
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Publication No.: US11946809B2Publication Date: 2024-04-02
- Inventor: Ingi Kim , Minhwan Seo , Sangwoo Bae , Akinori Okubo , Jungchul Lee , Eunhee Jeang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR 20210112471 2021.08.25
- Main IPC: G01J4/02
- IPC: G01J4/02 ; G01J4/04

Abstract:
Provided is a polarization measuring device including a stage on which a measurement target is provided, a light source assembly configured to emit incident light, a first polarimeter configured to polarize the incident light, a second polarimeter configured to polarize reflected light reflected from the measurement target that is irradiated by the incident light, a filter assembly configured to remove noise from the reflected light, and a detector configured to receive the reflected light and measure an intensity of the reflected light and a phase of the reflected light.
Public/Granted literature
- US20230068376A1 POLARIZATION MEASURING DEVICE AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME Public/Granted day:2023-03-02
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