Invention Grant
- Patent Title: Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
-
Application No.: US17971684Application Date: 2022-10-24
-
Publication No.: US11952658B2Publication Date: 2024-04-09
- Inventor: Katja Väyrynen , Timo Hatanpää , Mikko Ritala , Markku Leskelä
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: C23C16/08
- IPC: C23C16/08 ; C23C16/18 ; C23C16/455
Abstract:
A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
Public/Granted literature
Information query
IPC分类:
