Invention Grant
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
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Application No.: US16797035Application Date: 2020-02-21
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Publication No.: US11953829B2Publication Date: 2024-04-09
- Inventor: Kazunari Yagi , Takashi Kawashima , Tomotaka Tsuchimura , Hajime Furutani , Michihiro Shirakawa
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 17180108 2017.09.20 JP 18003463 2018.01.12
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F212/14 ; C08F220/28 ; G03F7/038 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38

Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of −2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is −2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.
Information query
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