Organo tin compound for thin film deposition and method for forming tin-containing thin film using same
Abstract:
According to the embodiment of the present disclosure, an organo tin compound is represented by the following Chemical Formula 1:






In Chemical Formula 1,
L1 and L2 are each independently selected from an alkoxy group having 1 to 10 carbon atoms and an alkylamino group having 1 to 10 carbon atoms,
R1 is a substituted or unsubstituted aryl group having 6 to 8 carbon atoms, and
R2 is selected from a substituted or unsubstituted linear alkyl group having 1 to 4 carbon atoms, a branched alkyl group having 3 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an allyl group having 2 to 4 carbon atoms.
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