- Patent Title: Methods of forming graphene and graphene manufacturing apparatuses
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Application No.: US17190852Application Date: 2021-03-03
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Publication No.: US11975971B2Publication Date: 2024-05-07
- Inventor: Sangwon Kim , Kyung-Eun Byun , Hyeonjin Shin , Eunkyu Lee , Changseok Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20200027216 2020.03.04
- Main IPC: B32B9/00
- IPC: B32B9/00 ; C01B32/186 ; B82Y30/00

Abstract:
A graphene manufacturing apparatus includes a reaction chamber a substrate supporter configured to structurally support a substrate inside the reaction chamber; a plasma generator configured to generate a plasma inside the reaction chamber; a first gas supply configured to supply an inert gas into the reaction chamber at a first height from an upper surface of the substrate supporter in a height direction of the reaction chamber; a second gas supply configured to supply a carbon source into the reaction chamber at a second height from the upper surface of the substrate supporter in the height direction of the reaction chamber; and a third gas supply configured to supply a reducing gas into the reaction chamber, wherein the first to third gas supply units are disposed at different heights at a third height from the upper surface of the substrate supporter in the height direction of the reaction chamber.
Public/Granted literature
- US20210276873A1 METHODS OF FORMING GRAPHENE AND GRAPHENE MANUFACTURING APPARATUSES Public/Granted day:2021-09-09
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