Invention Grant
- Patent Title: Apparatus for depositing thin films using hydrogen peroxide
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Application No.: US17324191Application Date: 2021-05-19
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Publication No.: US11987881B2Publication Date: 2024-05-21
- Inventor: Leonard Rodriguez
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: C23C16/452
- IPC: C23C16/452 ; C25B1/30 ; C25B1/50 ; C25B9/01 ; C25B9/21
Abstract:
A thin film deposition system is disclosed in order to form a thin film on a substrate. The thin film deposition system comprises a hydrogen peroxide source. The hydrogen peroxide source comprises an electrochemical cell that converts a hydrogen gas to a hydrogen ion gas. The electrochemical cell converts an oxygen gas and water into a liquid phase complex. The liquid phase complex reacts with the hydrogen ion gas to form hydrogen peroxide.
Public/Granted literature
- US20210363633A1 APPARATUS FOR DEPOSITING THIN FILMS USING HYDROGEN PEROXIDE Public/Granted day:2021-11-25
Information query
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