Invention Grant
- Patent Title: Method for producing gas sensor element, gas sensor element, and gas sensor
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Application No.: US17392368Application Date: 2021-08-03
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Publication No.: US12007353B2Publication Date: 2024-06-11
- Inventor: Yuki Hanaki , Suguru Kyomoto , Kaoru Osaki , Kotaro Ueda , Masaki Nakagawa
- Applicant: NGK SPARK PLUG CO., LTD.
- Applicant Address: JP Nagoya
- Assignee: NITERRA CO., LTD.
- Current Assignee: NITERRA CO., LTD.
- Current Assignee Address: JP Nagoya
- Agency: Sughrue Mion, PLLC
- Priority: JP 20135828 2020.08.11
- Main IPC: G01N27/409
- IPC: G01N27/409 ; B05D1/18 ; B05D1/38 ; B05D3/00 ; B05D7/00 ; G01N27/41

Abstract:
A method for producing a gas sensor element, for covering a detection portion (150) by an inner protection layer (21) and an outer protection layer (22), including: a first dipping step of dipping the gas sensor element into a first slurry S1 for the inner protection layer, to form a first coating film (700) on a front end surface (100c) and a peripheral surface (100d); a drying step of drying and solidifying the first coating film; a second dipping step of dipping, without removing the first coating film, the gas sensor element into a second slurry S2 for the outer protection layer, to form a second coating film (800) on a surface of the solidified first coating film; and a scraping-off step of performing scraping-off on the second coating film so as not to scrape-off the first coating film, to remove a part of the second coating film.
Information query