Invention Grant
- Patent Title: Charged particle beam writing apparatus
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Application No.: US17655876Application Date: 2022-03-22
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Publication No.: US12009175B2Publication Date: 2024-06-11
- Inventor: Hirofumi Morita , Takanao Touya
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 21067803 2021.04.13
- Main IPC: H01J37/12
- IPC: H01J37/12 ; H01J37/147 ; H01J37/317

Abstract:
In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.
Public/Granted literature
- US20220328278A1 CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2022-10-13
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