Invention Grant
- Patent Title: Silver-containing solution and method of forming silver catalyst layer in chemical plating
-
Application No.: US17846433Application Date: 2022-06-22
-
Publication No.: US12023653B2Publication Date: 2024-07-02
- Inventor: Hung-Yuan Hsieh
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW 1106315 2022.02.22
- Main IPC: B01J23/50
- IPC: B01J23/50 ; B01J33/00 ; B01J35/39 ; C23C18/42 ; C23C28/02

Abstract:
A method of forming a silver catalyst layer in chemical plating includes providing a substrate; applying a silver-containing solution onto the substrate; and applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate. The silver-containing solution includes silver ions, a diamine compound, a carboxylic acid compound, and a solvent. In addition, the substrate having the silver catalyst layer thereon can be immersed into a chemical plating solution to form a metal layer over the silver catalyst layer.
Public/Granted literature
- US20230264177A1 SILVER-CONTAINING SOLUTION AND METHOD OF FORMING SILVER CATALYST LAYER IN CHEMICAL PLATING Public/Granted day:2023-08-24
Information query