Invention Grant
- Patent Title: System and method for supplying and dispensing bubble-free photolithography chemical solutions
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Application No.: US16716792Application Date: 2019-12-17
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Publication No.: US12025917B2Publication Date: 2024-07-02
- Inventor: Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: G03F7/16
- IPC: G03F7/16 ; B67D7/02 ; B67D7/36 ; B67D7/78 ; H01L21/027
Abstract:
A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
Information query
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