Invention Grant
- Patent Title: Fluid handling system, method and lithographic apparatus
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Application No.: US17776369Application Date: 2020-10-12
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Publication No.: US12032296B2Publication Date: 2024-07-09
- Inventor: Yang-Shan Huang , Nicolaas Ten Kate
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 209814 2019.11.18
- International Application: PCT/EP2020/078599 2020.10.12
- International Announcement: WO2021/099027A 2021.05.27
- Date entered country: 2022-05-12
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.
Public/Granted literature
- US20220397830A1 A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS Public/Granted day:2022-12-15
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