Invention Grant
- Patent Title: Variable capacitance device with multiple two-dimensional electron gas (2DEG) layers
-
Application No.: US17848275Application Date: 2022-06-23
-
Publication No.: US12034085B2Publication Date: 2024-07-09
- Inventor: Harald Gossner , Peter Baumgartner , Uwe Hodel , Domagoj Siprak , Stephan Leuschner , Richard Geiger , Han Wui Then , Marko Radosavljevic , Sansaptak Dasgupta
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP
- The original application number of the division: US16641222
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/20 ; H01L29/778 ; H01L29/93

Abstract:
A variable capacitance III-N device having multiple two-dimensional electron gas (2DEG) layers are described. In some embodiments, the device comprises a first source and a first drain; a first polarization layer adjacent to the first source and the first drain; a first channel layer coupled to the first source and the first drain and adjacent to the first polarization layer, the first channel layer comprising a first 2DEG region; a second source and a second drain; a second polarization layer adjacent to the second source and the second drain; and a second channel layer coupled to the second source and the second drain and adjacent to the second polarization layer, the second channel layer comprising a second 2DEG region, wherein the second channel layer is over the first polarization layer.
Public/Granted literature
- US20220320350A1 VARIABLE CAPACITANCE DEVICE WITH MULTIPLE TWO-DIMENSIONAL ELECTRON GAS (2DEG) LAYERS Public/Granted day:2022-10-06
Information query
IPC分类: