Invention Grant
- Patent Title: Semiconductor device manufacturing system, semiconductor device inspection device, and semiconductor device manufacturing method
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Application No.: US16825512Application Date: 2020-03-20
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Publication No.: US12051629B2Publication Date: 2024-07-30
- Inventor: Seunghwa Hyun , Younghwan Kim , Hwayoung Park , Youngsu Ryu , Yusang Cheon
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Fish & Richardson P.C.
- Priority: KR 20190108456 2019.09.02
- Main IPC: H01L21/66
- IPC: H01L21/66 ; B05D1/00 ; G01N21/95 ; G03F7/16 ; H01L21/67
Abstract:
A semiconductor device manufacturing system includes a spin coater and a coating layer inspector. The spin coater includes: a chuck, a rotation driver configured to rotate the chuck; and a solution dispenser configured to spray a solution onto a portion of the coating layer formed on an edge portion of the wafer, wherein the coating layer inspector includes an edge inspection camera and an inspection controller configured to determine a radius, eccentricity, and a top-view shape of the coating layer, based on images of the edge portion of the wafer.
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Information query
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