Invention Grant
- Patent Title: Method for fabricating assemble substrate
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Application No.: US17831301Application Date: 2022-06-02
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Publication No.: US12114427B2Publication Date: 2024-10-08
- Inventor: Lung-Yuan Wang , Wen-Liang Lien
- Applicant: Siliconware Precision Industries Co., Ltd.
- Applicant Address: TW Taichung
- Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee Address: TW Taichung
- Agency: Studebaker & Brackett PC
- Priority: TW 8129257 2019.08.16
- The original application number of the division: US16589663 2019.10.01
- Main IPC: H05K3/32
- IPC: H05K3/32 ; H01L23/31 ; H05K1/11 ; H05K1/14 ; H05K1/18 ; H05K3/46 ; H05K1/02

Abstract:
A method for fabricating an assemble substrate is provided, including stacking a circuit portion on a plurality of circuit members. The circuit members are spaced apart from one another in a current packaging process to increase a layer area. The assemble substrate thus fabricated meets the requirements for a packaging substrate of a large size, and has a high yield and low fabrication cost.
Public/Granted literature
- US20220304157A1 METHOD FOR FABRICATING ASSEMBLE SUBSTRATE Public/Granted day:2022-09-22
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