Invention Grant
- Patent Title: Lithographic apparatus and method with improved contaminant particle capture
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Application No.: US17624901Application Date: 2020-06-04
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Publication No.: US12158706B2Publication Date: 2024-12-03
- Inventor: Marcus Adrianus Van de Kerkhof , Manish Ranjan
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP19185209 20190709
- International Application: PCT/EP2020/065529 WO 20200604
- International Announcement: WO2021/004704 WO 20210114
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.
Public/Granted literature
- US20220276573A1 LITHOGRAPHIC APPARATUS AND METHOD WITH IMPROVED CONTAMINANT PARTICLE CAPTURE Public/Granted day:2022-09-01
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