Invention Grant
- Patent Title: Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections
-
Application No.: US16697347Application Date: 2019-11-27
-
Publication No.: US12165838B2Publication Date: 2024-12-10
- Inventor: Xinrong Jiang , Christopher Sears
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz IP
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/073 ; H01J37/22

Abstract:
A scanning electron microscopy system may include an electron-optical sub-system and a controller. The electron-optical sub-system may include an electron source and an electron-optical column configured to direct an electron beam to a sample. The electron-optical column may include a double-lens assembly, a beam limiting aperture disposed between a first and second lens of the double-lens assembly, and a detector assembly configured to detect electrons scattered from the sample. In embodiments, the controller of the scanning electron microscopy system may be configured to: cause the electron-optical sub-system to form a flooding electron beam and perform flooding scans of the sample with the flooding electron beam; cause the electron-optical sub-system to form an imaging electron beam and perform imaging scans of the sample with the imaging electron beam; receive images acquired by the detector assembly during the imaging scans; and determine characteristics of the sample based on the images.
Information query