Invention Grant
- Patent Title: Wafer processing method and wafer processing apparatus
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Application No.: US18052912Application Date: 2022-11-05
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Publication No.: US12183635B2Publication Date: 2024-12-31
- Inventor: Kenya Kai , Kentaro Odanaka
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2019-175694 20190926
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/66 ; H01L21/67

Abstract:
A wafer processing apparatus including a supporting unit having a frame fixing section fixing the frame, and a wafer table having a front side and a rear side, the front side including a supporting face supporting the wafer and a transparent plate, a liquid layer forming unit including a nozzle section and forming a layer of a liquid on the supporting face of the wafer table, an imaging unit including an imaging camera positioned adjacent to the rear side of the wafer table and opposite to the supporting face on the front side of the wafer table and an air blowing nozzle blowing air to a region between the wafer table and the adhesive sheet.
Public/Granted literature
- US20230066868A1 WAFER PROCESSING METHOD AND WAFER PROCESSING APPARATUS Public/Granted day:2023-03-02
Information query
IPC分类: