Invention Grant
- Patent Title: Methods for depositing gap filling fluid
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Application No.: US17467590Application Date: 2021-09-07
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Publication No.: US12211742B2Publication Date: 2025-01-28
- Inventor: Timothee Blanquart , Viljami Pore , René Vervuurt , Jihee Jeon
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: C23C16/34
- IPC: C23C16/34 ; C23C16/455 ; C23C16/50 ; C23C16/52 ; H01L21/02 ; H01L21/768

Abstract:
Methods for manufacturing a structure comprising a substrate. The substrate comprises plurality of recesses. The recesses are at least partially filled with a gap filling fluid. The gap filling fluid comprises boron, nitrogen, and hydrogen. The gap filling fluid can be formed by introducing a precursor into the reaction chamber and introducing a co-reactant into the reaction chamber to form a gap filling fluid that at least partially fills the gap.
Public/Granted literature
- US20220076996A1 METHODS FOR DEPOSITING GAP FILING FLUIDS AND RELATED SYSTEMS AND DEVICES Public/Granted day:2022-03-10
Information query
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