Invention Grant
- Patent Title: Isolated volume seals and method of forming an isolated volume within a processing chamber
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Application No.: US18585505Application Date: 2024-02-23
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Publication No.: US12217982B2Publication Date: 2025-02-04
- Inventor: Kirankumar Neelasandra Savandaiah , Nitin Bharadwaj Satyavolu , Srinivasa Rao Yedla , Bhaskar Prasad , Thomas Brezoczky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C23C14/35 ; C23C14/50 ; H01J37/32 ; H01J37/34

Abstract:
A method and apparatus for substrate processing and a cluster tool including a transfer chamber assembly and a plurality of processing assemblies. Processing chamber volumes are sealed from the transfer chamber volume using a support chuck on which a substrate is disposed. A seal ring assembly is coupled to the support chuck. The seal ring assembly includes an inner assembly, an assembly bellows circumscribing the inner assembly, and a bellows disposed between the inner and outer platform. An inner ring is disposed between inner assembly of the seal ring assembly and the bottom surface of the support chuck. An outer ring disposed between the seal ring assembly and the lower sealing surface of the process chamber wall. The support chuck is raised to form an isolation seal between the processing chamber volume and the transfer chamber volume using the bellows, the inner ring, and the outer ring.
Public/Granted literature
- US20240332046A1 ISOLATED VOLUME SEALS AND METHOD OF FORMING AN ISOLATED VOLUME WITHIN A PROCESSING CHAMBER Public/Granted day:2024-10-03
Information query
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