Invention Grant
- Patent Title: Electrostatic discharge protection device
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Application No.: US17884533Application Date: 2022-08-09
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Publication No.: US12279460B2Publication Date: 2025-04-15
- Inventor: Ming-Hui Chen , Chih-Feng Lin , Chiu-Tsung Huang , Hsiang-Hung Chang
- Applicant: Powerchip Semiconductor Manufacturing Corporation
- Applicant Address: TW Hsinchu
- Assignee: Powerchip Semiconductor Manufacturing Corporation
- Current Assignee: Powerchip Semiconductor Manufacturing Corporation
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Priority: TW111121229 20220608
- Main IPC: H10D89/60
- IPC: H10D89/60

Abstract:
An electrostatic discharge (ESD) protection device including the following components is provided. A first transistor includes a first gate, a first N-type source region, and an N-type drain region. A second transistor includes a second gate, a second N-type source region, and the N-type drain region. The N-type drain region is located between the first gate and the second gate. An N-type drift region is located in a P-type substrate between the first gate and the second gate and is located directly below a portion of the first gate and directly below a portion of the second gate. The N-type drain region is located in the N-type drift region. A P-type barrier region is located in the P-type substrate below the N-type drift region. The P-type barrier region has an overlapping portion overlapping the N-type drift region. There is at least one first opening in the overlapping portion.
Public/Granted literature
- US20230411382A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE Public/Granted day:2023-12-21
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