Invention Grant
- Patent Title: Lithographic apparatus, metrology systems, and methods thereof
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Application No.: US18269191Application Date: 2021-12-02
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Publication No.: US12287591B2Publication Date: 2025-04-29
- Inventor: Arjan Johannes Anton Beukman , Sebastianus Adrianus Goorden , Stephen Roux , Sergei Sokolov , Filippo Alpeggiani
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- Agency: Sterne, Kessler, Goldstein, & Fox P.L.L.C
- International Application: PCT/EP2021/084063 WO 20211202
- International Announcement: WO2022/135870 WO 20220630
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F9/00
Abstract:
A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
Public/Granted literature
- US20240036485A1 LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF Public/Granted day:2024-02-01
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