Invention Grant
- Patent Title: Charged particle beam device and aberration correction method
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Application No.: US17778526Application Date: 2019-11-21
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Publication No.: US12327708B2Publication Date: 2025-06-10
- Inventor: Shingo Hayashi , Hideto Dohi , Zhaohui Cheng , Hideyuki Kazumi
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2019/045623 WO 20191121
- International Announcement: WO2021/100172 WO 20210527
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/244 ; H01J37/28

Abstract:
A charged particle optical system includes an aberration corrector 209 that corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detector 215 by irradiating a sample with the charged particle beam before and after the first multipole field is generated.
Public/Granted literature
- US20220415605A1 Charged Particle Beam Device and Aberration Correction Method Public/Granted day:2022-12-29
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