Invention Application
- Patent Title: Non-dripping nozzle apparatus
- Patent Title (中): 无滴水喷嘴装置
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Application No.: US10743928Application Date: 2003-12-22
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Publication No.: US20050133075A1Publication Date: 2005-06-23
- Inventor: Andrew Nguyen
- Applicant: Andrew Nguyen
- Main IPC: H01L21/00
- IPC: H01L21/00 ; B08B3/00

Abstract:
According to one aspect of the invention, a dispense head for a wafer processing apparatus is provided. The dispense head may include an inlet, at least one outlet, a drain, and a passageway therethrough interconnecting the inlet, the outlet, and the drain. The inlet may be a first height above a bottom of the passageway, the outlet may be a second height above the bottom, and the drain may be a third height above the bottom. A first valve may be connected to the inlet, and a second valve may be connected to the drain. When the first valve is opened and the second valve is closed, fluid flows into the inlet and out of the outlet. When the second valve is opened and the first valve is closed, fluid from the passageway flows out of the drain. A pump may be connected to the drain.
Public/Granted literature
- US07241342B2 Non-dripping nozzle apparatus Public/Granted day:2007-07-10
Information query
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