Invention Application
- Patent Title: Projection optical system, exposure apparatus and method using the same
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Application No.: US11302155Application Date: 2005-12-14
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Publication No.: US20060092392A1Publication Date: 2006-05-04
- Inventor: Yuhei Sumiyoshi , Masayuki Suzuki
- Applicant: Yuhei Sumiyoshi , Masayuki Suzuki
- Priority: JP104484/2002(PAT. 20020405
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A projection optical system includes an optical element that includes and locally uses a reflective or refractive area that is substantially axially symmetrical around an optical axis, the optical element being rotatable around the optical axis.
Public/Granted literature
- US07365826B2 Projection optical system, exposure apparatus and method using the same Public/Granted day:2008-04-29
Information query
