Invention Application
- Patent Title: Ex-situ removal of deposition on an optical element
- Patent Title (中): 在光学元件上原位去除沉积
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Application No.: US11527728Application Date: 2006-09-27
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Publication No.: US20070069162A1Publication Date: 2007-03-29
- Inventor: Vadim Banine , Vladimir Ivanov , Josephus Smits , Harm-Jan Voorma , Lambertus Adrianus Den Wildenberg , Vladimir Krivtsun , Alexander Struycken , Carolus Ida Antonius Spee , Klaas Timmer , Johannes Ridder
- Applicant: Vadim Banine , Vladimir Ivanov , Josephus Smits , Harm-Jan Voorma , Lambertus Adrianus Den Wildenberg , Vladimir Krivtsun , Alexander Struycken , Carolus Ida Antonius Spee , Klaas Timmer , Johannes Ridder
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G01J3/10
- IPC: G01J3/10

Abstract:
A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
Public/Granted literature
- US07767989B2 Ex-situ removal of deposition on an optical element Public/Granted day:2010-08-03
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