Invention Application
- Patent Title: Electrostatic deflection system with impedance matching for high positioning accuracy
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Application No.: US11241789Application Date: 2005-09-30
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Publication No.: US20070075256A1Publication Date: 2007-04-05
- Inventor: Benyamin Buller , William Devore , Juergen Frosien , Eugene Mirro , Henry Pearce-Percy , Dieter Winkler
- Applicant: Benyamin Buller , William Devore , Juergen Frosien , Eugene Mirro , Henry Pearce-Percy , Dieter Winkler
- Main IPC: H01J37/147
- IPC: H01J37/147

Abstract:
An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.
Public/Granted literature
- US07227155B2 Electrostatic deflection system with impedance matching for high positioning accuracy Public/Granted day:2007-06-05
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