Invention Application
US20070098614A1 Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma
失效
采用氧化催化剂和低温等离子体的气体处理方法和气体处理装置
- Patent Title: Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma
- Patent Title (中): 采用氧化催化剂和低温等离子体的气体处理方法和气体处理装置
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Application No.: US10560980Application Date: 2004-03-30
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Publication No.: US20070098614A1Publication Date: 2007-05-03
- Inventor: Akemitsu Iida , Akira Mizuno
- Applicant: Akemitsu Iida , Akira Mizuno
- Priority: JP2003-172553 20030617
- International Application: PCT/JP04/04521 WO 20040330
- Main IPC: B01D53/72
- IPC: B01D53/72

Abstract:
A method for treating a gas characterized in that a low temperature plasma is generated in the presence of a metallic oxide oxidation catalyst, and an apparatus for treating a gas characterized by containing a low temperature plasma-generating unit carrying a metallic oxide oxidation catalyst are disclosed. According to the treating method and the treating apparatus, harmful components (such as carbon monoxide or a volatile organic compound) in a gas to be treated can be efficiently oxidized and rendered harmless, a foul odor may be rendered odorless, and further, microorganisms may be removed from and reduced in the treated gas.
Public/Granted literature
- US07347979B2 Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma Public/Granted day:2008-03-25
Information query
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