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    GAS EXCITATION APPARATUS HAVING SUSPENDED ELECTRODE AND GAS EXCITATION METHOD
    3.
    发明申请
    GAS EXCITATION APPARATUS HAVING SUSPENDED ELECTRODE AND GAS EXCITATION METHOD 审中-公开
    具有悬挂电极的气体激励装置和气体激发方法

    公开(公告)号：US20090301860A1

    公开(公告)日：2009-12-10

    申请号：US11915928

    申请日：2006-05-31

    Applicant: Akemitsu Iida ,  Takayuki Kawakita

    Inventor： Akemitsu Iida ,  Takayuki Kawakita

    IPC: B01J19/08

    CPC classification number: H05H1/46 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2001/466

    Abstract: An apparatus for exciting a gas, comprising at least a pair of electrodes connecting to an alternating current source in a housing having an inlet opening for a gas to be treated and an outlet opening for a gas which has been treated, characterized in that one electrode of the pair of the electrodes is a suspended electrode arranged by placing it under a tension at a predetermined position in the housing, the other electrode of the pair of the electrodes is a buried electrode arranged at a predetermined position by being buried in the holding wall of the housing at the end thereof, an electrode portion of the buried electrode contains a linear or planar discharging portion as a whole, and the electrode portion of the suspended electrode, opposed to the electrode portion of the buried electrode, has discharging portions where a distance from the electrode portion of the buried electrode becomes cyclically short.

    Abstract translation: 一种用于激发气体的装置，包括在具有用于待处理气体的入口开口的壳体中连接到交流电源的至少一对电极和用于已经被处理的气体的出口开口，其特征在于，一个电极 一对电极是通过将其放置在壳体中的预定位置处的张力而布置的悬置电极，一对电极的另一个电极是通过埋在保持壁中而布置在预定位置的埋入电极 在埋入电极的电极部分整体上包含线状或平面放电部分，与埋电极的电极部分相对的悬置电极的电极部分具有放电部分，其中， 与埋电极的电极部分的距离变得周期性短。

    Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma
    5.
    发明申请
    Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma 失效
    采用氧化催化剂和低温等离子体的气体处理方法和气体处理装置

    公开(公告)号：US20070098614A1

    公开(公告)日：2007-05-03

    申请号：US10560980

    申请日：2004-03-30

    Applicant: Akemitsu Iida ,  Akira Mizuno

    Inventor： Akemitsu Iida ,  Akira Mizuno

    IPC: B01D53/72

    CPC classification number: B01J19/087 ,  A61L9/22 ,  B01D53/32 ,  B01D53/864 ,  B01D53/8687 ,  B01D2257/30 ,  B01D2257/502 ,  B01D2257/708 ,  B01D2259/818 ,  B01J15/005 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0875 ,  B01J2219/0896

    Abstract: A method for treating a gas characterized in that a low temperature plasma is generated in the presence of a metallic oxide oxidation catalyst, and an apparatus for treating a gas characterized by containing a low temperature plasma-generating unit carrying a metallic oxide oxidation catalyst are disclosed. According to the treating method and the treating apparatus, harmful components (such as carbon monoxide or a volatile organic compound) in a gas to be treated can be efficiently oxidized and rendered harmless, a foul odor may be rendered odorless, and further, microorganisms may be removed from and reduced in the treated gas.

    Abstract translation: 一种处理气体的方法，其特征在于在金属氧化物氧化催化剂的存在下产生低温等离子体，并且公开了一种用于处理气体的装置，其特征在于包含含有金属氧化物氧化催化剂的低温等离子体发生装置 。 根据处理方法和处理装置，待处理气体中的有害成分（例如一氧化碳或挥发性有机化合物）可以被有效地氧化并变得无害，可以使臭味变得无臭，而且微生物可能 在处理过的气体中被去除和还原。

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