Invention Application
US20120012032A1 DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES 有权
分散的硅酸钠颗粒的分散体

DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES
Abstract:
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
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