Invention Application
- Patent Title: DEFECTED GROUND STRUCTURE WITH SHIELDING EFFECT
- Patent Title (中): 具有屏蔽效应的缺陷接地结构
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Application No.: US12902155Application Date: 2010-10-12
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Publication No.: US20120057323A1Publication Date: 2012-03-08
- Inventor: Tzong-Lin Wu , Yu-Hao Hsu , Chung-Hao Tsai
- Applicant: Tzong-Lin Wu , Yu-Hao Hsu , Chung-Hao Tsai
- Applicant Address: TW Taipei
- Assignee: National Taiwan University
- Current Assignee: National Taiwan University
- Current Assignee Address: TW Taipei
- Priority: TW99130391 20100908
- Main IPC: H05K9/00
- IPC: H05K9/00

Abstract:
A defected ground structure with shielding effect is provided. The structure includes a dielectric layer, a defected metal layer, a grounded metal layer and at least a conductive mushroom-like structure. The defected metal layer has a line-shaped opening and is disposed in the dielectric layer. The conductive mushroom-like structure is disposed between the defected metal layer and the grounded metal layer and is arranged along an extending direction of the line-shaped opening periodically. The conductive mushroom-like structure includes a fungating part and a stipe part. The fungating part is parallel to the defected metal layer and a distance is maintained away from the defected metal layer. The projection area of the fungating part on the defected metal layer covers a length of the line-shaped opening corresponding to the fungating part. The stipe part connects the fungating part and the grounded metal layer.
Public/Granted literature
- US08570114B2 Defected ground structure with shielding effect Public/Granted day:2013-10-29
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