Invention Application
US20130176543A1 OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUID CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES
有权
OPTOFLUIDIC LITHOGRAPHY系统,制造两层微流体通道的方法和制造三维微结构的方法
- Patent Title: OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUID CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES
- Patent Title (中): OPTOFLUIDIC LITHOGRAPHY系统,制造两层微流体通道的方法和制造三维微结构的方法
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Application No.: US13554288Application Date: 2012-07-20
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Publication No.: US20130176543A1Publication Date: 2013-07-11
- Inventor: Sunghoon KWON , SeungAh LEE , Wook PARK , Su Eun CHUNG
- Applicant: Sunghoon KWON , SeungAh LEE , Wook PARK , Su Eun CHUNG
- Applicant Address: KR Seoul
- Assignee: SNU R&DB FOUNDATION
- Current Assignee: SNU R&DB FOUNDATION
- Current Assignee Address: KR Seoul
- Priority: KR10-2008-0088683 20080909
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
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