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1.发明授权Image processing-based lithography system and method of coating target object 有权基于图像处理的光刻系统和涂覆目标物体的方法公开(公告)号：US09323159B2
公开(公告)日：2016-04-26
申请号：US13433938
申请日：2012-03-29
Applicant: Sung Hoon Kwon , Sueun Chung , Seungah Lee , Jisung Jang , Sangkwon Han
Inventor： Sung Hoon Kwon , Sueun Chung , Seungah Lee , Jisung Jang , Sangkwon Han
CPC classification number: C23C16/52 , G03F7/16 , G03F7/2057 , G03F7/70291 , G03F7/70466 , G03F7/70483 , G03F7/705 , G03F7/70525 , G03F7/70625 , G03F7/7085 , G03F9/00 , H01L21/561
Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
Abstract translation: 公开了一种与光刻系统相关的技术。 光刻系统包括设置在基板上的至少一个目标物体，被配置为处理目标对象的图像以确定目标对象的涂层的光学图案的处理器，以及配置为提供具有光学元件的光的曝光装置 图案由处理器确定到基板。
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2.发明申请IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND METHOD OF COATING TARGET OBJECT 有权基于图像处理的图像系统和涂覆目标对象的方法公开(公告)号：US20120236278A1
公开(公告)日：2012-09-20
申请号：US13433938
申请日：2012-03-29
Applicant: Sung Hoon KWON , Sueun Chung , Seungah Lee , Jisung Jang , Sangkwon Han
Inventor： Sung Hoon KWON , Sueun Chung , Seungah Lee , Jisung Jang , Sangkwon Han
CPC classification number: C23C16/52 , G03F7/16 , G03F7/2057 , G03F7/70291 , G03F7/70466 , G03F7/70483 , G03F7/705 , G03F7/70525 , G03F7/70625 , G03F7/7085 , G03F9/00 , H01L21/561
Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
Abstract translation: 公开了一种与光刻系统相关的技术。 光刻系统包括设置在基板上的至少一个目标物体，被配置为处理目标对象的图像以确定目标对象的涂层的光学图案的处理器，以及配置为提供具有光学元件的光的曝光装置 图案由处理器确定到基板。
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3.发明授权公开(公告)号：US08641404B2
公开(公告)日：2014-02-04
申请号：US13554288
申请日：2012-07-20
Applicant: Sunghoon Kwon , SeungAh Lee , Wook Park , Su Eun Chung
Inventor： Sunghoon Kwon , SeungAh Lee , Wook Park , Su Eun Chung
IPC: B28B7/30
CPC classification number: G03F7/70341 , B29C64/106 , B29L2031/756 , B33Y30/00 , B81C99/0095 , B81C2201/0159 , F15B7/08 , F15B15/10 , G03B27/54 , G03F7/20 , G03F7/70416
Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
Abstract translation: 提供了包括膜，微流体通道和气动室的光流体光刻系统。 膜可以位于气动室和微流体通道之间。 微流体通道可以具有对应于膜的位移的高度并且具有在其中流动的流体，流体由从底部照射的光固化以形成微结构。 气动室可以根据其内部大气压力而引起膜的移位。
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4.发明申请COMPOSITE FILM FOR LIGHT-EMITTING APPARATUS, LIGHT-EMITTING APPARATUS AND METHOD FOR PRODUCING THE COMPOSITE FILM 审中-公开用于发光装置的复合膜，发光装置和用于生产复合膜的方法公开(公告)号：US20120182714A1
公开(公告)日：2012-07-19
申请号：US13432515
申请日：2012-03-28
Applicant: Sunghoon KWON , Sueun Chung , Seungah Lee , Jisung Jang , Sangkwon Han
Inventor： Sunghoon KWON , Sueun Chung , Seungah Lee , Jisung Jang , Sangkwon Han
CPC classification number: G02B5/02 , G02B19/0023 , G02B19/0066 , G02B27/09 , H01L33/50 , H01L33/58 , H01L2924/0002 , H05B33/10 , H05B33/14 , H01L2924/00
Abstract: Provided is a composite film used for a light emitting apparatus including a light emitting device. The composite film includes a fluorescent layer including phosphors and an optical plate disposed on the fluorescent layer, and diffusing, reducing or mixing at least one of light emitted by the light emitting device, light emitted by the phosphors and a combination thereof.
Abstract translation: 提供了一种用于包括发光器件的发光装置的复合膜。 该复合膜包括荧光体层和布置在荧光层上的光学板，并且扩散，减少或混合由发光器件发射的光中的至少一种，由荧光体发射的光及其组合。
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Patent Agency Ranking
5.发明授权公开(公告)号：US08246889B2
公开(公告)日：2012-08-21
申请号：US12555428
申请日：2009-09-08
Applicant: Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
Inventor： Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
IPC: B28B7/30
CPC classification number: G03F7/70341 , B29C64/106 , B29L2031/756 , B33Y30/00 , B81C99/0095 , B81C2201/0159 , F15B7/08 , F15B15/10 , G03B27/54 , G03F7/20 , G03F7/70416
Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
Abstract translation: 提供了包括膜，微流体通道和气动室的光流体光刻系统。 膜可以位于气动室和微流体通道之间。 微流体通道可以具有对应于膜的位移的高度并且具有在其中流动的流体，流体由从底部照射的光固化以形成微结构。 气动室可以根据其内部大气压力而引起膜的移位。
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6.发明申请OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUID CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES 有权OPTOFLUIDIC LITHOGRAPHY系统，制造两层微流体通道的方法和制造三维微结构的方法公开(公告)号：US20130176543A1
公开(公告)日：2013-07-11
申请号：US13554288
申请日：2012-07-20
Applicant: Sunghoon KWON , SeungAh LEE , Wook PARK , Su Eun CHUNG
Inventor： Sunghoon KWON , SeungAh LEE , Wook PARK , Su Eun CHUNG
IPC: G03F7/20
CPC classification number: G03F7/70341 , B29C64/106 , B29L2031/756 , B33Y30/00 , B81C99/0095 , B81C2201/0159 , F15B7/08 , F15B15/10 , G03B27/54 , G03F7/20 , G03F7/70416
Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
Abstract translation: 提供了包括膜，微流体通道和气动室的光流体光刻系统。 膜可以位于气动室和微流体通道之间。 微流体通道可以具有对应于膜的位移的高度并且具有在其中流动的流体，流体由从底部照射的光固化以形成微结构。 气动室可以根据其内部大气压力而引起膜的移位。
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公开(公告)号：US08408892B2
公开(公告)日：2013-04-02
申请号：US12681698
申请日：2008-10-01
Applicant: Sunghoon Kwon , JiYun Kim , Wook Park , HyunSung Park , SeungAh Lee , SuEun Chung
Inventor： Sunghoon Kwon , JiYun Kim , Wook Park , HyunSung Park , SeungAh Lee , SuEun Chung
IPC: B29C35/08
CPC classification number: B29C39/22 , B81C99/0095 , B81C2201/0159 , G03F7/2035
Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.
Abstract translation: 提供流体通道系统。 流体通道系统包括光投射装置，流体通道和轨道。 光投射装置提供光。 由光选择性固化的光固化流体在流体通道内流动。 通过固化可光固化流体而形成的精细结构沿轨道移动。
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公开(公告)号：US20110006464A1
公开(公告)日：2011-01-13
申请号：US12681698
申请日：2008-10-01
Applicant: Sunghoon Kwon , JiYun Kim , Wook Park , HyunSung Park , SeungAh Lee , SuEun Chung
Inventor： Sunghoon Kwon , JiYun Kim , Wook Park , HyunSung Park , SeungAh Lee , SuEun Chung
CPC classification number: B29C39/22 , B81C99/0095 , B81C2201/0159 , G03F7/2035
Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.
Abstract translation: 提供流体通道系统。 流体通道系统包括光投射装置，流体通道和轨道。 光投射装置提供光。 由光选择性固化的光固化流体在流体通道内流动。 通过固化可光固化流体而形成的精细结构沿轨道移动。
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9.发明申请OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUIDIC CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES 有权OPTOFLUIDIC LITHOGRAPHY系统，制造两层微流体通道的方法和制造三维微结构的方法公开(公告)号：US20100060875A1
公开(公告)日：2010-03-11
申请号：US12555428
申请日：2009-09-08
Applicant: Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
Inventor： Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
CPC classification number: G03F7/70341 , B29C64/106 , B29L2031/756 , B33Y30/00 , B81C99/0095 , B81C2201/0159 , F15B7/08 , F15B15/10 , G03B27/54 , G03F7/20 , G03F7/70416
Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
Abstract translation: 提供了包括膜，微流体通道和气动室的光流体光刻系统。 膜可以位于气动室和微流体通道之间。 微流体通道可以具有对应于膜的位移的高度并且具有在其中流动的流体，流体由从底部照射的光固化以形成微结构。 气动室可以根据其内部大气压力而引起膜的移位。
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